Hierarchical porous patterns have been fabricated on the C face, Si face, and cross section of n-type 6H–SiC crystal via photo-electrochemical etching using HF/C2H5OH and HF/H2O2 as electrolytes. The porous layer displayed multiple and multiscale microstructures on different faces, including stalactite-like, sponge-like and dendritic porous structures on C face, echinoid micro-patterns on Si face, and columnar and keel-shaped micro-patterns on the cross section. The formation of hierarchical porous pattern is ascribed to the dynamic competition balance between the electrochemical oxidation rate and the oxide removal rate. It was found that increasing the ionic strength of the electrolyte can obviously disturb the surface morphology of the porous SiC during the photo-electrochemical etching. Possible mechanisms for selective etching were further discussed.
Source:Journal of Materials Science & Technology
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PAM-XIAMEN provide for SiC crystal wafer,GaN crystal wafer,Germanium crystal wafer: 2”,3”,4”,GaAs crystal wafer,CZT crystal wafer
Jan 25, 2014
Jan 21, 2014
Defect evolution during growth of SiC crystals
SiC single crystals grown by sublimation exhibit relatively high dislocation densities and often contain a network of slightly misoriented grains. In order to understand the evolution of dislocation structures and grain boundaries during growth, we studied wafers sliced from different parts of the sublimation-grown SiC single crystals. The wafers have been characterized using imaging with crossed-polarizing filters, etching in molten KOH, optical microscopy and X-ray rocking curves. It was found that in the growth direction from the seed towards the boule dome the dislocation density decreases and the crystal quality as determined by X-ray diffraction measurements improves, while the cross-polarizer image contrast becomes more pronounced. The observed trends are discussed.
Source: Journal of Crystal Growth
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Source: Journal of Crystal Growth
If you need more information about Defect evolution during growth of SiC crystals, please visit our website:http://www.powerwaywafer.com, send us email at powerwaymaterial@gmail.com.
Jan 13, 2014
Low indium-doped LEC GaAs crystal growth employing thermal stress analysis
Recently, dislocation-free LEC GaAs crystals have been able to be grown by indium doping at the 1020 cm-3level. However, striations and In inclusions are still problems in In-doped LEC GaAs. We have overcome these problems by reducing the doped In concentration. The ingots have been grown so that the calculated stress value in any part of the ingot may not exceed 0.07 kg/mm2, which was the critical resolved shear stress estimated by the thermal stress analysis. Employing this technique under the same growth conditions as those for the low dislocation, (4–5) x 103 cm-2 etch pit density, undoped GaAs crystal, dislocation-free 2 inch diameter wafers have been obtained at (1–4) x 1019 cm-3 In doping level.
Source:Journal of Crystal Growth
Source:Journal of Crystal Growth
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employing thermal stress analysis, please visit our
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Jan 9, 2014
Two-channel IR gas sensor with two detectors based on LiTaO3 single-crystal wafer
Sc:Ce:LiTaO3 crystals
were grown by using the Czochralski method. The two-wave coupling experiments
and transmitted facula distortion method were used to measuring the
photorefractive properties and the optical damage resistance, respectively. It
was found that the photorefractive response speed of Sc:Ce:LiTaO3 was four times
faster than that of Ce:LiTaO3 and
the resistance ability to optical damage was two orders higher than that of
Ce:LiTaO3.
It could be attributed to the Ce ions losing their electron acceptor
properties, which result in the increase of photoconductivity. In this paper,
site occupation mechanism of impurities was also discussed to explain the
increased of photoconductivity.
Source:Xiangli
Liu
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you need more information about Influence of Sc ions on optical properties of
Ce:LiTaO3 crystals, please visit our website:http://www.powerwaywafer.com, send
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Investigations on growth and two-wavelength holographic storage properties varied with RuO2 codoping in Fe:LiNbO3 crystals
A series of Ru:Fe:LiNbO 3 crystals with
fixed concentration of Fe2O3(0.1 wt%)
and varied RuO2 were grown by the Czochralski technique via the
optimum growth condition. After growth, the crystals were cut to wafers and
then oxidized to Nb2O5 powder. The X-ray diffraction and UV–vis spectra
were measured to analyze the defect structure of the crystals. The blue
photorefractive properties of Ru:Fe:LiNbO3 crystals
were investigated in a two-wave mixing experiment at the wavelength of
476 nm. The results showed that Ru:Fe:LiNbO3 crystals with high concentration of RuO2 are promising candidates for holographic
storage. The two-wavelength nonvolatile holographic storage experiment was
carried out with sample 6.
Source:Journal
of Crystal Growth
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you need more information about Investigations on growth and two-wavelength
holographic storage properties varied with RuO2 codoping in Fe:LiNbO3 crystals,
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Jan 2, 2014
Electrical properties and electrical field in depletion layer for CZT crystals
Current—voltage (I—V)
and capacitance—voltage (C—V)
characteristics of Au/p-CZT contacts with different surface treatments on
cadmium zinc telluride (CZT) wafer's surface were measured with Agilent 4339B
high resistance meter and Agilent 4294A precision impedance analyzer,
respectively. The Schottky barrier height was 0.85±0.05, 0.96±0.05 eV for
non-passivated and passivated CZT crystals by I—V measurement. By C—V measurement, the Schottky barrier height was
1.39±0.05, 1.51±0.05 eV for non-passivated and passivated CZT crystals. The
results show that the passivation treatment can increase the barrier height of
the Au/p-CZT contact and decrease the leakage current. The main reason is that
the higher barrier height of Au/p-CZT contacts can decrease the possibility for
electrons to pass through the native TeO2 film. Most of the applied voltage appears on the
depleted layer and there is only a negligible voltage drops across the nearly
undepleted region. Furthermore, the electric field in the depleted layer is not
uniform and can be calculated by the depletion approximation. The maximum
electric field of CZT crystals is Eml=133 V/cm at x=0 for
non-passivated CZT crystal and Em2=55
V/cm for passivated CZT crystal, respectively.
If you need more information about Electrical properties and electrical field in depletion layer for CZT crystals, please visit our website:http://www.powerwaywafer.com, send us email at powerwaymaterial@gmail.com.
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